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Personal profile
Andrew Lam received his Ph.D. in Chemical Engineering from Cornell University where he focused his research on the epitaxial growth of Group-IV semiconductor materials: "Epitaxial CVD Studies of Gas-Surface Reactivity and Film Growth Selectivity in Group-IV Semiconductor Si-Ge Heteroepitaxial Strained Systems via Supersonic Molecular Beams".
Andrew started his career in the semiconductor industry in Silicon Valley, California, during which he assumed a multi-functional position as "Member of Technical Staff / Key Account Technologist / Sr. R&D Process Engineer" covering a spectrum from R&D in the lab creating intellectual property/patents to technology transfer and implementation via joint-development projects with strategic industrial partners and customers such as Intel, TSMC, and Samsung generating revenue for the company.
Moreover, Andrew's entrepreneurial spirit is evident from his subsequent role as "Director, Surface Catalysis and Reaction Engineering" at a startup in San Francisco. He was a key contributor since the company's inception as an individual as well as concurrently as a collective aiming to invent, develop, and commercialize miniaturized electrical-power generators with highly porous 3D semiconductor materials and device structures.
It is this synergistic blend of fundamental research and entrepreneurial aspiration that equips him to further mature in a research-led and co-developed industry-themed academic setting at XJTLU Entrepreneur College, Taicang. His participation seeks to collaboratively and interactively motivate students, exchange ideas with faculty members across disciplines, and team up with industrial partners to bring future education to now.
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Projects
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Wafer-scale Fabrication and Characterization of Thin-film Lithium Tantalate (LiTaO3) on Insulator (LTOI) for Next-generation Photonic Integrated Circuits (PICs)
1/07/25 → 30/06/28
Project: Internal Research Project
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Selective SI:C epitaxy in recessed areas and characterization of the material properties
Kim, Y., Ye, Z., Lam, A., Zojaji, A., Cho, Y. & Kuppurao, S., 2007, ECS Transactions - International Symposium on Advanced Gate Stack, Source/Drain and Channel Engineering for Si-based CMOS: New Materials, Processes and Equipment, 3. 1 ed. Electrochemical Society Inc., p. 409-417 9 p. (ECS Transactions; vol. 6, no. 1).Research output: Chapter in Book or Report/Conference proceeding › Conference Proceeding › peer-review
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Application of selective Si:C epitaxy for recessed source/drain Technology
Kim, Y., Ye, Z., Zojaji, A., Lam, A., Sanchez, E. & Kuppurao, S., 2006, SiGe and Ge: Materials, Processing, and Devices. 7 ed. Electrochemical Society Inc., p. 467-471 5 p. (ECS Transactions; vol. 3, no. 7).Research output: Chapter in Book or Report/Conference proceeding › Conference Proceeding › peer-review
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Development of high growth rate selective silicon epitaxy at low substrate temperatures for dram elevated Source/Drain application
Lam, A., Ye, Z. & Kim, Y., 2006, Semiconductor Technology, ISTC2007 - Proceedings of the 6th International Conference on Semiconductor Technology. Electrochemical Society, p. 1-3 3 p. (Semiconductor Technology, ISTC2007 - Proceedings of the 6th International Conference on Semiconductor Technology).Research output: Chapter in Book or Report/Conference proceeding › Conference Proceeding › peer-review
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Low temperature selective Si and Si-based alloy epitaxy for advanced transistor applications
Kim, Y., Zojaji, A., Ye, Z., Lam, A., Dalida, N., Sanchez, E. & Kuppurao, S., 2006, Transistor Scaling-Methods, Materials and Modeling. Materials Research Society, p. 125-130 6 p. (Materials Research Society Symposium Proceedings; vol. 913).Research output: Chapter in Book or Report/Conference proceeding › Conference Proceeding › peer-review
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Application of selective SiGe epitaxy for recessed source/drain of PMOS transistor
Kim, Y., Samoilov, A., Washington, L., Moroz, V., Lam, A., Dalida, N., Kawaguchi, M. & Shen, M., 2004, p. 77-88. 12 p.Research output: Contribution to conference › Paper › peer-review
4 Citations (Scopus)