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Temperature-dependent oxygen annealing effect on the properties of Ga2O3 thin film deposited by atomic layer deposition
Lin Gu, Hong Ping Ma*, Yi Shen, Jie Zhang, Wen Jie Chen, Ruo Yun Yang, Fanzhengshu Wu, Lei Yang, Yu Xuan Zeng, Xi Rui Wang, Jing Tao Zhu, Qing Chun Zhang
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
20
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(Scopus)