Atomistic mechanisms of SiC electrochemical mechanical polishing in aqueous H2O2: A ReaxFF molecular dynamics study

Rui Zhu, Tianyu Zhang, Qingyu Yao, Yang Peng, Feng Cheng, Zirui Wang, Yongguang Wang*, Xiaolong Lu*, Chuanyang Wang, Yongwu Zhao

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

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