RF characterization of metal T-gate structure in fully-depleted SOI CMOS technology

Sang Lam*, Hui Wan, Pin Su, Peter W. Wyatt, C. L. Chen, Ali M. Niknejad, Chenming Hu, Ping K. Ko, Mansun Chan

*Corresponding author for this work

Research output: Contribution to journalLetterpeer-review

10 Citations (Scopus)

Fingerprint

Dive into the research topics of 'RF characterization of metal T-gate structure in fully-depleted SOI CMOS technology'. Together they form a unique fingerprint.