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Insight into the atomic-scale material removal of 4H-SiC electrochemical mechanical polishing (ECMP) using graphene oxide
Zirui Wang, Yuguang Zhu, Ronghao Ren, Tianyu Zhang, Yang Peng, Yongguang Wang*, Xiaolong Lu, Chuanyang Wang
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review