Fluorine-doped graphene oxide prepared by direct plasma treatment for supercapacitor application

Yelyn Sim, Subramani Surendran, Hamchorom Cha, Hyeonuk Choi, Minyeong Je, Seungryul Yoo, Dong Chan Seok, Yong Ho Jung, Cheolho Jeon, Dong Jin Kim, Mi Kyung Han, Heechae Choi*, Uk Sim, Joonhee Moon

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

53 Citations (Scopus)

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