Electrical properties and interfacial studies of HfxTi1-xO2 high permittivity gate insulators deposited on germanium substrates

Qifeng Lu, Yifei Mu, Joseph W. Roberts, Mohammed Althobaiti, Vinod R. Dhanak, Jingjin Wu, Chun Zhao, Ce Zhou Zhao*, Qian Zhang, Li Yang, Ivona Z. Mitrovic, Stephen Taylor, Paul R. Chalker

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

18 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Electrical properties and interfacial studies of HfxTi1-xO2 high permittivity gate insulators deposited on germanium substrates'. Together they form a unique fingerprint.