Effects of rapid thermal annealing on structural, chemical, and electrical characteristics of atomic-layer deposited lanthanum doped zirconium dioxide thin film on 4H-SiC substrate

Way Foong Lim, Hock Jin Quah, Qifeng Lu, Yifei Mu, Wan Azli Wan Ismail, Bazura Abdul Rahim, Siti Rahmah Esa, Yeh Yee Kee, Ce Zhou Zhao, Zainuriah Hassan, Kuan Yew Cheong*

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

9 Citations (Scopus)

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