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Cold silicon preamorphization implant and presilicide sulfur implant for advanced nickel silicide contacts
Yi Tong*, Qian Zhou, Kain Lu Low, Lan Xiang Wang, Lye Hing Chua, Thirumal Thanigaivelan, Todd Henry, Yee Chia Yeo
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
4
Citations
(Scopus)