AlGaN/GaN FiNFET: A comparative study

U. F. Ahmed, S. Rehman, U. Rafique, M. M. Ahmed

Research output: Chapter in Book or Report/Conference proceedingConference Proceedingpeer-review

2 Citations (Scopus)

Abstract

In this paper, a comprehensive study is conducted on AlGaN/GaN FinFETs as a potential candidate for microwave and power applications. It has been described that due to superior material properties associated with GaN and electrical properties exhibited by the tri-gate structure, FinFETs offer superior results for radio frequency applications. The tri-gate structure of FinFET allows full depletion of the channel, which results in low leakage current and dynamic power loss. FinFETs offer higher current density and integration compared to other mainstream CMOS technologies.

Original languageEnglish
Title of host publication2018 14th International Conference on Emerging Technologies, ICET 2018
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781538681435
DOIs
Publication statusPublished - 4 Jan 2019
Externally publishedYes
Event14th International Conference on Emerging Technologies, ICET 2018 - Islamabad, Pakistan
Duration: 21 Nov 201822 Nov 2018

Publication series

Name2018 14th International Conference on Emerging Technologies, ICET 2018

Conference

Conference14th International Conference on Emerging Technologies, ICET 2018
Country/TerritoryPakistan
CityIslamabad
Period21/11/1822/11/18

Keywords

  • AlGaN/GaN FinFET
  • CMOS
  • Comparative study
  • RF/power applications
  • Tri-gate

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