Resistive switching performance of memristor with solution-processed stacked MO/2D-materials switching layers

Zongjie Shen, Chun Zhao, Ivona Z. Mitrovic, Cezhou Zhao, Yina Liu, Li Yang

Research output: Chapter in Book or Report/Conference proceedingConference Proceedingpeer-review

1 Citation (Scopus)

Abstract

In this work, the RRAM device with the structure of Ag/AlOx/MXene/ITO was fabricated with the stacked solution-processed switching layers. The device operated with a low voltage around ~2.0 V and exhibited a stable ON/OFF ratio larger than 10. Apart from excellent stability with endurance cycles of more than 100 and retention time of longer than 10 s, typical synaptic behaviors including long-term potentiation and depression (LTP/LTD) were also obtained, which had a positive influence on the following pattern recognition process and the average value of the recognition was around ~90%.

Original languageEnglish
Title of host publication2021 International Conference on IC Design and Technology, ICICDT 2021
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781665449984
DOIs
Publication statusPublished - 2021
Event2021 International Conference on IC Design and Technology, ICICDT 2021 - Dresden, Germany
Duration: 15 Sept 202117 Sept 2021

Publication series

Name2021 International Conference on IC Design and Technology, ICICDT 2021

Conference

Conference2021 International Conference on IC Design and Technology, ICICDT 2021
Country/TerritoryGermany
CityDresden
Period15/09/2117/09/21

Keywords

  • MXene
  • RRAM
  • pattern recognition
  • synaptic behaviors

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