Phase-shift control in two-beam laser interference lithography

Jia Xu; Wei Zhang; Lanjiao Liu; Zuobin Wang; Jin Zhang; Zhengxun Song; Zhankun Weng; Zhen Hu; Yong Yue; Dayou Li

doi:10.1109/ICMA.2011.5985725

Phase-shift control in two-beam laser interference lithography

Jia Xu^*, Wei Zhang, Lanjiao Liu, Zuobin Wang, Jin Zhang, Zhengxun Song, Zhankun Weng, Zhen Hu, Yong Yue, Dayou Li

^*Corresponding author for this work

Research output: Chapter in Book or Report/Conference proceeding › Conference Proceeding › peer-review

5 Citations (Scopus)

Abstract

This paper presents a method of phase-shift control in two-beam laser interference lithography. In the method, a PZT actuator is used to push a mirror and introduce phase shifts in a He-Ne laser interference lithography simulation system. When different voltages are applied to the PZT actuator, fringe positions are changed accordingly, and the phase shifts are introduced. The phase shifts can be determined by fringe pattern correlation with subpixel accuracy. This method is useful in two-beam laser interference lithography for the control of phase shifts and fringe positions in interference patterns for multi-exposure patterning applications.

Original language	English
Title of host publication	2011 IEEE International Conference on Mechatronics and Automation, ICMA 2011
Pages	579-583
Number of pages	5
DOIs	https://doi.org/10.1109/ICMA.2011.5985725
Publication status	Published - 2011
Externally published	Yes
Event	2011 IEEE International Conference on Mechatronics and Automation, ICMA 2011 - Beijing, China Duration: 7 Aug 2011 → 10 Aug 2011

Publication series

Name	2011 IEEE International Conference on Mechatronics and Automation, ICMA 2011

Conference

Conference	2011 IEEE International Conference on Mechatronics and Automation, ICMA 2011
Country/Territory	China
City	Beijing
Period	7/08/11 → 10/08/11

Keywords

Laser interference lithography
phase shift
phase shift control

Access to Document

10.1109/ICMA.2011.5985725

Cite this

Xu, J., Zhang, W., Liu, L., Wang, Z., Zhang, J., Song, Z., Weng, Z., Hu, Z., Yue, Y., & Li, D. (2011). Phase-shift control in two-beam laser interference lithography. In 2011 IEEE International Conference on Mechatronics and Automation, ICMA 2011 (pp. 579-583). Article 5985725 (2011 IEEE International Conference on Mechatronics and Automation, ICMA 2011). https://doi.org/10.1109/ICMA.2011.5985725

@inproceedings{2229c26732c848e0905b9d29306f2534,

title = "Phase-shift control in two-beam laser interference lithography",

abstract = "This paper presents a method of phase-shift control in two-beam laser interference lithography. In the method, a PZT actuator is used to push a mirror and introduce phase shifts in a He-Ne laser interference lithography simulation system. When different voltages are applied to the PZT actuator, fringe positions are changed accordingly, and the phase shifts are introduced. The phase shifts can be determined by fringe pattern correlation with subpixel accuracy. This method is useful in two-beam laser interference lithography for the control of phase shifts and fringe positions in interference patterns for multi-exposure patterning applications.",

keywords = "Laser interference lithography, phase shift, phase shift control",

author = "Jia Xu and Wei Zhang and Lanjiao Liu and Zuobin Wang and Jin Zhang and Zhengxun Song and Zhankun Weng and Zhen Hu and Yong Yue and Dayou Li",

year = "2011",

doi = "10.1109/ICMA.2011.5985725",

language = "English",

isbn = "9781424481149",

series = "2011 IEEE International Conference on Mechatronics and Automation, ICMA 2011",

pages = "579--583",

booktitle = "2011 IEEE International Conference on Mechatronics and Automation, ICMA 2011",

note = "2011 IEEE International Conference on Mechatronics and Automation, ICMA 2011 ; Conference date: 07-08-2011 Through 10-08-2011",

}

Xu, J, Zhang, W, Liu, L, Wang, Z, Zhang, J, Song, Z, Weng, Z, Hu, Z, Yue, Y & Li, D 2011, Phase-shift control in two-beam laser interference lithography. in 2011 IEEE International Conference on Mechatronics and Automation, ICMA 2011., 5985725, 2011 IEEE International Conference on Mechatronics and Automation, ICMA 2011, pp. 579-583, 2011 IEEE International Conference on Mechatronics and Automation, ICMA 2011, Beijing, China, 7/08/11. https://doi.org/10.1109/ICMA.2011.5985725

Phase-shift control in two-beam laser interference lithography. / Xu, Jia; Zhang, Wei; Liu, Lanjiao et al.
2011 IEEE International Conference on Mechatronics and Automation, ICMA 2011. 2011. p. 579-583 5985725 (2011 IEEE International Conference on Mechatronics and Automation, ICMA 2011).

Research output: Chapter in Book or Report/Conference proceeding › Conference Proceeding › peer-review

TY - GEN

T1 - Phase-shift control in two-beam laser interference lithography

AU - Xu, Jia

AU - Zhang, Wei

AU - Liu, Lanjiao

AU - Wang, Zuobin

AU - Zhang, Jin

AU - Song, Zhengxun

AU - Weng, Zhankun

AU - Hu, Zhen

AU - Yue, Yong

AU - Li, Dayou

PY - 2011

Y1 - 2011

N2 - This paper presents a method of phase-shift control in two-beam laser interference lithography. In the method, a PZT actuator is used to push a mirror and introduce phase shifts in a He-Ne laser interference lithography simulation system. When different voltages are applied to the PZT actuator, fringe positions are changed accordingly, and the phase shifts are introduced. The phase shifts can be determined by fringe pattern correlation with subpixel accuracy. This method is useful in two-beam laser interference lithography for the control of phase shifts and fringe positions in interference patterns for multi-exposure patterning applications.

AB - This paper presents a method of phase-shift control in two-beam laser interference lithography. In the method, a PZT actuator is used to push a mirror and introduce phase shifts in a He-Ne laser interference lithography simulation system. When different voltages are applied to the PZT actuator, fringe positions are changed accordingly, and the phase shifts are introduced. The phase shifts can be determined by fringe pattern correlation with subpixel accuracy. This method is useful in two-beam laser interference lithography for the control of phase shifts and fringe positions in interference patterns for multi-exposure patterning applications.

KW - Laser interference lithography

KW - phase shift

KW - phase shift control

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DO - 10.1109/ICMA.2011.5985725

M3 - Conference Proceeding

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SN - 9781424481149

T3 - 2011 IEEE International Conference on Mechatronics and Automation, ICMA 2011

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BT - 2011 IEEE International Conference on Mechatronics and Automation, ICMA 2011

T2 - 2011 IEEE International Conference on Mechatronics and Automation, ICMA 2011

Y2 - 7 August 2011 through 10 August 2011

ER -

Phase-shift control in two-beam laser interference lithography

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Keywords

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