Patterning thin polymer films by surface-directed dewetting and pattern transfer

Zexin Zhang; Zhe Wang; Rubo Xing; Yanchun Han

doi:10.1016/S0032-3861(03)00315-X

Patterning thin polymer films by surface-directed dewetting and pattern transfer

Zexin Zhang, Zhe Wang, Rubo Xing, Yanchun Han^*

^*Corresponding author for this work

CAS - Changchun Institute of Applied Chemistry

Research output: Contribution to journal › Article › peer-review

85 Citations (Scopus)

Abstract

The pattern evolution processes of thin polystyrene (PS) film on chemically patterned substrates during dewetting have been investigated experimentally. The substrates have patterns of self-assembly monolayers produced by microcontact printing with octadecyltrichlorosilane. Optical microscopy and atomic force microscopy images reveal that ordered micrometer scale pattern can be created by surface direct dewetting. Various pattern sizes and pattern complexities can be achieved by controlling the experimental parameters. The dewetting pattern has been transferred to form PDMS stamp for soft lithography.

Original language	English
Pages (from-to)	3737-3743
Number of pages	7
Journal	Polymer
Volume	44
Issue number	13
DOIs	https://doi.org/10.1016/S0032-3861(03)00315-X
Publication status	Published - 30 May 2003
Externally published	Yes

Keywords

Dewetting
Pattern
Polymer film

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10.1016/S0032-3861(03)00315-X

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abstract = "The pattern evolution processes of thin polystyrene (PS) film on chemically patterned substrates during dewetting have been investigated experimentally. The substrates have patterns of self-assembly monolayers produced by microcontact printing with octadecyltrichlorosilane. Optical microscopy and atomic force microscopy images reveal that ordered micrometer scale pattern can be created by surface direct dewetting. Various pattern sizes and pattern complexities can be achieved by controlling the experimental parameters. The dewetting pattern has been transferred to form PDMS stamp for soft lithography.",

keywords = "Dewetting, Pattern, Polymer film",

author = "Zexin Zhang and Zhe Wang and Rubo Xing and Yanchun Han",

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T1 - Patterning thin polymer films by surface-directed dewetting and pattern transfer

AU - Zhang, Zexin

AU - Wang, Zhe

AU - Xing, Rubo

AU - Han, Yanchun

PY - 2003/5/30

Y1 - 2003/5/30

N2 - The pattern evolution processes of thin polystyrene (PS) film on chemically patterned substrates during dewetting have been investigated experimentally. The substrates have patterns of self-assembly monolayers produced by microcontact printing with octadecyltrichlorosilane. Optical microscopy and atomic force microscopy images reveal that ordered micrometer scale pattern can be created by surface direct dewetting. Various pattern sizes and pattern complexities can be achieved by controlling the experimental parameters. The dewetting pattern has been transferred to form PDMS stamp for soft lithography.

AB - The pattern evolution processes of thin polystyrene (PS) film on chemically patterned substrates during dewetting have been investigated experimentally. The substrates have patterns of self-assembly monolayers produced by microcontact printing with octadecyltrichlorosilane. Optical microscopy and atomic force microscopy images reveal that ordered micrometer scale pattern can be created by surface direct dewetting. Various pattern sizes and pattern complexities can be achieved by controlling the experimental parameters. The dewetting pattern has been transferred to form PDMS stamp for soft lithography.

KW - Dewetting

KW - Pattern

KW - Polymer film

UR - http://www.scopus.com/inward/record.url?scp=0037685153&partnerID=8YFLogxK

U2 - 10.1016/S0032-3861(03)00315-X

DO - 10.1016/S0032-3861(03)00315-X

M3 - Article

AN - SCOPUS:0037685153

SN - 0032-3861

VL - 44

SP - 3737

EP - 3743

JO - Polymer

JF - Polymer

IS - 13

ER -

Patterning thin polymer films by surface-directed dewetting and pattern transfer

Abstract

Keywords

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