Microstructural and surface properties of cobalt containing amorphous carbon thin film deposited by a filtered cathodic vacuum arc

Daniel H.C. Chua; W. I. Milne; B. K. Tay; P. Zhang; X. Z. Ding

doi:10.1116/1.1535174

Microstructural and surface properties of cobalt containing amorphous carbon thin film deposited by a filtered cathodic vacuum arc

Daniel H.C. Chua^*, W. I. Milne, B. K. Tay, P. Zhang, X. Z. Ding

^*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

Surface properties of ta-C:Co films deposited under different conditions were investigated with x-ray photoelectron spectroscopy (XPS) and contact angle measurements. Two different sets of films, one produced by varying Co-content and the other produced by varying the applied bias, were deposited and tested. XPS and Raman measurements showed that the carbon sp³ content was maximum at low Co content under approximately -80 V bias. An increase in bias from -120 V to -500 V caused a huge increase in sp² content over the entire film.

Original language	English
Pages (from-to)	353-358
Number of pages	6
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	21
Issue number	2
DOIs	https://doi.org/10.1116/1.1535174
Publication status	Published - Mar 2003
Externally published	Yes

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abstract = "Surface properties of ta-C:Co films deposited under different conditions were investigated with x-ray photoelectron spectroscopy (XPS) and contact angle measurements. Two different sets of films, one produced by varying Co-content and the other produced by varying the applied bias, were deposited and tested. XPS and Raman measurements showed that the carbon sp3 content was maximum at low Co content under approximately -80 V bias. An increase in bias from -120 V to -500 V caused a huge increase in sp2 content over the entire film.",

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AU - Tay, B. K.

AU - Zhang, P.

AU - Ding, X. Z.

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AB - Surface properties of ta-C:Co films deposited under different conditions were investigated with x-ray photoelectron spectroscopy (XPS) and contact angle measurements. Two different sets of films, one produced by varying Co-content and the other produced by varying the applied bias, were deposited and tested. XPS and Raman measurements showed that the carbon sp3 content was maximum at low Co content under approximately -80 V bias. An increase in bias from -120 V to -500 V caused a huge increase in sp2 content over the entire film.

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Microstructural and surface properties of cobalt containing amorphous carbon thin film deposited by a filtered cathodic vacuum arc

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