Influence of dopant type in single crystal Si on the electroless plated Ni-P films

Hua Li Ma*, Xin Yue Zhang, Yin Xiao Du, Lei Ming Chen, Yi Ru, Rui Zhang, Fan Guang Zeng, Bo Liu, Kai Liu, Hao Liang

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

The Ni-P Films are electrolessly deposited respectively on n-Si (100) and p-Si (100). On the same preparation condition, the surface images and compositions of films on different substrate are analyzed by SEM and energy spectrometer, and flatness of films is studied by AFM. And the results show that the surface images, flatness and compositions of films are apparently dense as p-Si substrate and n-Si substrate, the quality of films on p-Si substrate is preferable.

Original languageEnglish
Pages (from-to)564-568
Number of pages5
JournalGongneng Cailiao yu Qijian Xuebao/Journal of Functional Materials and Devices
Volume17
Issue number6
Publication statusPublished - Dec 2011
Externally publishedYes

Keywords

  • Electroless
  • N-Si
  • Ni-P films
  • P-Si

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