Abstract
The Ni-P Films are electrolessly deposited respectively on n-Si (100) and p-Si (100). On the same preparation condition, the surface images and compositions of films on different substrate are analyzed by SEM and energy spectrometer, and flatness of films is studied by AFM. And the results show that the surface images, flatness and compositions of films are apparently dense as p-Si substrate and n-Si substrate, the quality of films on p-Si substrate is preferable.
Original language | English |
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Pages (from-to) | 564-568 |
Number of pages | 5 |
Journal | Gongneng Cailiao yu Qijian Xuebao/Journal of Functional Materials and Devices |
Volume | 17 |
Issue number | 6 |
Publication status | Published - Dec 2011 |
Externally published | Yes |
Keywords
- Electroless
- N-Si
- Ni-P films
- P-Si