How to form regular polymer microstructures by surface-pattern-directed dewetting

Zexin Zhang; Zhe Wang; Rubo Xing; Yanchun Han

doi:10.1016/S0039-6028(03)00785-4

How to form regular polymer microstructures by surface-pattern-directed dewetting

Zexin Zhang, Zhe Wang, Rubo Xing, Yanchun Han^*

^*Corresponding author for this work

CAS - Changchun Institute of Applied Chemistry

Research output: Contribution to journal › Article › peer-review

52 Citations (Scopus)

Abstract

The substrates with regular patterns of self-assembly monolayers (SAMs) produced by microcontact printing with octadecyltrichlorosilane (OTS) was employed to direct thin polystyrene dewetting to fabricate ordered micrometer scale pattern. The pattern sizes and pattern fashion can be manipulated by controlling the experimental parameters. The pattern formation mechanisms have been discussed. The dewetting pattern can be transferred to form PDMS stamp for future microfabrication process.

Original language	English
Pages (from-to)	129-136
Number of pages	8
Journal	Surface Science
Volume	539
Issue number	1-3
DOIs	https://doi.org/10.1016/S0039-6028(03)00785-4
Publication status	Published - 1 Aug 2003
Externally published	Yes

Keywords

Atomic force microscopy
Self-assembly
Wetting

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10.1016/S0039-6028(03)00785-4

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abstract = "The substrates with regular patterns of self-assembly monolayers (SAMs) produced by microcontact printing with octadecyltrichlorosilane (OTS) was employed to direct thin polystyrene dewetting to fabricate ordered micrometer scale pattern. The pattern sizes and pattern fashion can be manipulated by controlling the experimental parameters. The pattern formation mechanisms have been discussed. The dewetting pattern can be transferred to form PDMS stamp for future microfabrication process.",

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AU - Wang, Zhe

AU - Xing, Rubo

AU - Han, Yanchun

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N2 - The substrates with regular patterns of self-assembly monolayers (SAMs) produced by microcontact printing with octadecyltrichlorosilane (OTS) was employed to direct thin polystyrene dewetting to fabricate ordered micrometer scale pattern. The pattern sizes and pattern fashion can be manipulated by controlling the experimental parameters. The pattern formation mechanisms have been discussed. The dewetting pattern can be transferred to form PDMS stamp for future microfabrication process.

AB - The substrates with regular patterns of self-assembly monolayers (SAMs) produced by microcontact printing with octadecyltrichlorosilane (OTS) was employed to direct thin polystyrene dewetting to fabricate ordered micrometer scale pattern. The pattern sizes and pattern fashion can be manipulated by controlling the experimental parameters. The pattern formation mechanisms have been discussed. The dewetting pattern can be transferred to form PDMS stamp for future microfabrication process.

KW - Atomic force microscopy

KW - Self-assembly

KW - Wetting

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How to form regular polymer microstructures by surface-pattern-directed dewetting

Abstract

Keywords

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