@inproceedings{0a38bd195f8f44668c4b76563f8d948d,
title = "Fully Solution-Processed Sodium Doped ZnO Thin-Film Transistors via a Low-Temperature Aqueous Route",
abstract = "In this study, we develop a simple and eco-friendly aqueous route for the fabrication of sodium (Na) doped ZnO/AlOxthin-film transistors (TFTs). To prepare Na doped ZnO and AlOxthin films, ammonia water and deionized water were used as the precursor solvents. The A1Oxthin film annealed at 300°C showed an areal-capacitance of 129 nf/cm2 at 1 kHz. On the basis of its implementation as the gate oxide, fully solution-processed Na doped ZnO TFTs were fabricated and the electrical characteristics were systematically studied. The fully solution processed Na doped ZnO/A1OxTFTs exhibited a high field effect mobility of 21 cm2 V-1 s-1, a subthreshold swing of 0.58 V/decade, a threshold voltage of 0.8 V, and an on/off current ratio of 2×104.",
keywords = "aqueous route, low-temperature, metal oxide thin-film transistors, solution-processed",
author = "Liu, {Q. H.} and Wei, {Y. L.} and Cao, {Y. X.} and C. Zhao and Zhao, {C. Z.} and Mitrovic, {I. Z.} and S. Hall and Xu, {W. Y.} and L. Yang and Lim, {E. G.} and Wang, {Q. N.}",
note = "Funding Information: ACKNOWLEDGMENT This research was funded in part by the National Natural Science Foundation of China (21503169, 2175011441, and 61704111), Key Program Special Fund in XJTLU (KSF-P-02, KSF-A-04, KSF-A-05 and KSF-A-07). Publisher Copyright: {\textcopyright} 2019 IEEE.; 2019 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2019 ; Conference date: 01-04-2019 Through 03-04-2019",
year = "2019",
month = apr,
doi = "10.1109/EUROSOI-ULIS45800.2019.9041881",
language = "English",
series = "2019 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2019",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
booktitle = "2019 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2019",
}