Error factors affecting the result of Laser Interference Lithography

Jin Zhang; Shilei Jiang; Chunlei Tan; Zuobin Wang; Dayou Li; Yong Yue; Renxi Qiu; Guobin Sun; Lihong Yang; Sanlong Wang

doi:10.1109/3M-NANO.2013.6737387

Error factors affecting the result of Laser Interference Lithography

Jin Zhang^*, Shilei Jiang, Chunlei Tan, Zuobin Wang, Dayou Li, Yong Yue, Renxi Qiu, Guobin Sun, Lihong Yang, Sanlong Wang

^*Corresponding author for this work

Research output: Chapter in Book or Report/Conference proceeding › Conference Proceeding › peer-review

1 Citation (Scopus)

Abstract

Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.

Original language	English
Title of host publication	2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings
Publisher	IEEE Computer Society
Pages	70-73
Number of pages	4
ISBN (Print)	9781479912131
DOIs	https://doi.org/10.1109/3M-NANO.2013.6737387
Publication status	Published - 2013
Externally published	Yes
Event	2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Suzhou, China Duration: 26 Aug 2013 → 30 Aug 2013

Publication series

Name	2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings

Conference

Conference	2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013
Country/Territory	China
City	Suzhou
Period	26/08/13 → 30/08/13

Keywords

constrast
error factors
interference lithography

Access to Document

10.1109/3M-NANO.2013.6737387

Cite this

Zhang, J., Jiang, S., Tan, C., Wang, Z., Li, D., Yue, Y., Qiu, R., Sun, G., Yang, L., & Wang, S. (2013). Error factors affecting the result of Laser Interference Lithography. In 2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings (pp. 70-73). Article 6737387 (2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings). IEEE Computer Society. https://doi.org/10.1109/3M-NANO.2013.6737387

Zhang, Jin ; Jiang, Shilei ; Tan, Chunlei et al. / Error factors affecting the result of Laser Interference Lithography. 2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings. IEEE Computer Society, 2013. pp. 70-73 (2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings).

@inproceedings{14fecbbf62ba4618bce2b2957dfc7d1c,

title = "Error factors affecting the result of Laser Interference Lithography",

abstract = "Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.",

keywords = "constrast, error factors, interference lithography",

author = "Jin Zhang and Shilei Jiang and Chunlei Tan and Zuobin Wang and Dayou Li and Yong Yue and Renxi Qiu and Guobin Sun and Lihong Yang and Sanlong Wang",

year = "2013",

doi = "10.1109/3M-NANO.2013.6737387",

language = "English",

isbn = "9781479912131",

series = "2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings",

publisher = "IEEE Computer Society",

pages = "70--73",

booktitle = "2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings",

note = "2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 ; Conference date: 26-08-2013 Through 30-08-2013",

}

Zhang, J, Jiang, S, Tan, C, Wang, Z, Li, D, Yue, Y, Qiu, R, Sun, G, Yang, L & Wang, S 2013, Error factors affecting the result of Laser Interference Lithography. in 2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings., 6737387, 2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings, IEEE Computer Society, pp. 70-73, 2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013, Suzhou, China, 26/08/13. https://doi.org/10.1109/3M-NANO.2013.6737387

Error factors affecting the result of Laser Interference Lithography. / Zhang, Jin; Jiang, Shilei; Tan, Chunlei et al.
2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings. IEEE Computer Society, 2013. p. 70-73 6737387 (2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings).

Research output: Chapter in Book or Report/Conference proceeding › Conference Proceeding › peer-review

TY - GEN

T1 - Error factors affecting the result of Laser Interference Lithography

AU - Zhang, Jin

AU - Jiang, Shilei

AU - Tan, Chunlei

AU - Wang, Zuobin

AU - Li, Dayou

AU - Yue, Yong

AU - Qiu, Renxi

AU - Sun, Guobin

AU - Yang, Lihong

AU - Wang, Sanlong

PY - 2013

Y1 - 2013

N2 - Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.

AB - Laser Interference Lithography (LIL) techniques enable quantitative generation of periodic structures such as array of holes, dots and lines, which are the intrinsic structure in some optical functional material. In this paper, the most common errors factors that could affect the result of laser interference lithography were presented. The methods to enhance the quality of patterns of LIL also have been introduced.

KW - constrast

KW - error factors

KW - interference lithography

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U2 - 10.1109/3M-NANO.2013.6737387

DO - 10.1109/3M-NANO.2013.6737387

M3 - Conference Proceeding

AN - SCOPUS:84896758647

SN - 9781479912131

T3 - 2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings

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EP - 73

BT - 2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings

PB - IEEE Computer Society

T2 - 2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013

Y2 - 26 August 2013 through 30 August 2013

ER -

Zhang J, Jiang S, Tan C, Wang Z, Li D, Yue Y et al. Error factors affecting the result of Laser Interference Lithography. In 2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings. IEEE Computer Society. 2013. p. 70-73. 6737387. (2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings). doi: 10.1109/3M-NANO.2013.6737387

Error factors affecting the result of Laser Interference Lithography

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Keywords

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