@article{3b22afed35c743aeb309ae00076015c3,
title = "Effects of polarization on four-beam laser interference lithography",
abstract = "This paper demonstrates that polarization plays an important role in the formation of interference patterns, pattern contrasts, and periods in four-beam interference lithography. Three different polarization modes are presented to study the effects of polarization on four-beam laser interference based on theoretical analysis, simulations, and experiments. A four-beam laser interference system was set up to modify the silicon surface. It was found that the secondary periodicity or modulation was the result of the misaligned or unequal incident angles only in the case of the TE-TE-TM-TM mode. The resulting patterns have shown a good correspondence with the theoretical analysis and simulations.",
author = "Dapeng Wang and Zuobin Wang and Ziang Zhang and Yong Yue and Dayou Li and Carsten Maple",
note = "Funding Information: This work was supported by National Key Basic Research Program of China (973 Program No. 2012CB326400 and No. 2012CB326406), Special Development Program of Central Financial Support to Local Universities (No. 2011-183), EU FP7 (LaserNaMi No. 247644; ECNANOMAN No. 269219), International Science and Technology Cooperation Program of China (No. 2012DFA11070), National Natural Science Foundation Program of China (No. 60940035 and No. 61176002), Doctoral Program of Higher Education of China (No. 20112216110002), Jilin Provincial Science and Technology Program (No. 201115157, No. 20090401 and No. 20110704), Guangdong Science and Technology Program (No. 2009B091300006 and No. 2011B010700101), Science and Technology Program of Changchun City (No. 09GH07 and No. 11KP04), and Program of Changchun University of Science and Technology (No. 129666 and No. XJJLG201101). ",
year = "2013",
month = feb,
day = "25",
doi = "10.1063/1.4793752",
language = "English",
volume = "102",
journal = "Applied Physics Letters",
issn = "0003-6951",
number = "8",
}