TY - GEN
T1 - Comparison of GaN HEMT Thermal Resistance Measurement Method Between Uniform Pulse Method and Modulation Method
AU - Luo, Ningyu
AU - Wen, Huiqing
N1 - Publisher Copyright:
© 2023 IEEE.
PY - 2023
Y1 - 2023
N2 - This paper mainly introduces the validation and comparison of two GaN HEMT device thermal resistance characterization methods: the uniform pulse method and the modulation method. The research group simulated the response of the two methods to different error sources on a computer, examined their feasibility, and explored their robustness towards different error sources. In this paper, the basic principles of the two error sources were selected according to the packaging temperature fluctuations and measurement delay cooling as error sources. The simulation results show that the uniform pulse method is more strongly affected by errors caused by packaging temperature fluctuations, while the modulation method can effectively resist errors caused by this factor. Meanwhile, both measurement methods failed to resist the measurement delay error, showing significant error increases in the delay duration scan from 0-10% off duration of maximum delay. In Addition, the modulation factor of the modulation method showcases an impact on the error ratio under the same delay time in the simulation.
AB - This paper mainly introduces the validation and comparison of two GaN HEMT device thermal resistance characterization methods: the uniform pulse method and the modulation method. The research group simulated the response of the two methods to different error sources on a computer, examined their feasibility, and explored their robustness towards different error sources. In this paper, the basic principles of the two error sources were selected according to the packaging temperature fluctuations and measurement delay cooling as error sources. The simulation results show that the uniform pulse method is more strongly affected by errors caused by packaging temperature fluctuations, while the modulation method can effectively resist errors caused by this factor. Meanwhile, both measurement methods failed to resist the measurement delay error, showing significant error increases in the delay duration scan from 0-10% off duration of maximum delay. In Addition, the modulation factor of the modulation method showcases an impact on the error ratio under the same delay time in the simulation.
UR - http://www.scopus.com/inward/record.url?scp=85184666821&partnerID=8YFLogxK
U2 - 10.1109/SSLChinaIFWS60785.2023.10399764
DO - 10.1109/SSLChinaIFWS60785.2023.10399764
M3 - Conference Proceeding
AN - SCOPUS:85184666821
T3 - 2023 20th China International Forum on Solid State Lighting and 2023 9th International Forum on Wide Bandgap Semiconductors, SSLCHINA: IFWS 2023
SP - 187
EP - 190
BT - 2023 20th China International Forum on Solid State Lighting and 2023 9th International Forum on Wide Bandgap Semiconductors, SSLCHINA
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 20th China International Forum on Solid State Lighting and 9th International Forum on Wide Bandgap Semiconductors, SSLCHINA: IFWS 2023
Y2 - 27 November 2023 through 30 November 2023
ER -