TY - GEN
T1 - Beam alignment in Laser Interference Nanolithography
AU - Song, Hao
AU - Xu, Jia
AU - Liu, Yanyan
AU - Pan, Haiyan
AU - Song, Zhengxun
AU - Weng, Zhankun
AU - Hu, Zhen
AU - Wang, Zuobin
AU - Zhang, Jin
AU - Yue, Yong
AU - Li, Dayou
PY - 2010
Y1 - 2010
N2 - Laser Interference Nanolithography (LInL) can produce nanostructure patterns by two or more coherent laser beams on the sample surface. In LInL, incident positions, incident angles and space angles of beams determine the lithography pattern and exposure area. In this work, a method for beam alignment in LInL was described. The method is based on the detection of the light spot which is formed by the incident beam on the sample surface, obtaining the parameters of the light spot by image processing including the incident position, incident angle and space angle of the beam. Proper system alignment can eliminate errors of beam incidence to ensure that the final lithography pattern and the exposure area can comply with the design. Computer simulation and experimental results have shown the accuracy, repeatability and limitation of the method, and it can be used in laser interference nanolithography.
AB - Laser Interference Nanolithography (LInL) can produce nanostructure patterns by two or more coherent laser beams on the sample surface. In LInL, incident positions, incident angles and space angles of beams determine the lithography pattern and exposure area. In this work, a method for beam alignment in LInL was described. The method is based on the detection of the light spot which is formed by the incident beam on the sample surface, obtaining the parameters of the light spot by image processing including the incident position, incident angle and space angle of the beam. Proper system alignment can eliminate errors of beam incidence to ensure that the final lithography pattern and the exposure area can comply with the design. Computer simulation and experimental results have shown the accuracy, repeatability and limitation of the method, and it can be used in laser interference nanolithography.
KW - Beam alignment
KW - Detection
KW - Laser interference nanolithography
KW - Light spot
UR - http://www.scopus.com/inward/record.url?scp=79951987517&partnerID=8YFLogxK
U2 - 10.1109/ICISE.2010.5689617
DO - 10.1109/ICISE.2010.5689617
M3 - Conference Proceeding
AN - SCOPUS:79951987517
SN - 9781424480968
T3 - 2nd International Conference on Information Science and Engineering, ICISE2010 - Proceedings
SP - 1065
EP - 1068
BT - 2nd International Conference on Information Science and Engineering, ICISE2010 - Proceedings
T2 - 2nd International Conference on Information Science and Engineering, ICISE2010
Y2 - 4 December 2010 through 6 December 2010
ER -