| Translated title of the contribution | A hafnium silicate-based metal oxide semiconductor capacitor device |
|---|---|
| Original language | Chinese (Simplified) |
| Patent granted number | CN209747510U |
| Validity date | 12/04/29 |
| Publication status | Published - 6 Dec 2019 |
一种基于硅酸铪的金属氧化物半导体电容器件
Research output: Patent