Project Details
Project Title (In Chinese)
高性能GaN基器件无金工艺和CMOS绝缘薄膜生长技术研究
Fund Amount (RMB)
50000.00
| Project Category | Suzhou Science and Technology Development Planning Programme: Key Industrial Technology Innovation - Prospective Applied Basic Research Project |
|---|---|
| Status | Finished |
| Effective start/end date | 1/07/17 → 30/06/19 |
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