Photomask defect extraction by using difference between a reference image and a test image after illumination adjustment

Youngmin Ha; Hong Jeong

doi:10.1109/IPC.2007.53

Photomask defect extraction by using difference between a reference image and a test image after illumination adjustment

Youngmin Ha^*, Hong Jeong

^*Corresponding author for this work

Pohang University of Science and Technology

Research output: Chapter in Book or Report/Conference proceeding › Conference Proceeding › peer-review

3 Citations (Scopus)

Abstract

A new method for extracting a photomask defect by using two optical photomask images, a reference image and a test image, is described in this paper. If the same scale, the same height-to-width ratio, zero parallel translation, and zero rotation between two images are assumed, then a large pixel value of the absolute difference image between the images would indicate the existence of a defect at the pixel. However, not only a true defect but a false defect also causes some large pixel values in the absolute difference image due to illumination difference between the reference image and the test image. To adjust the illumination of the reference image to that of the test image, a dynamic programming is used, and the defect in the test image is segmented.

Original language	English
Title of host publication	Proceedings The 2007 International Conference on Intelligent Pervasive Computing, IPC 2007
Pages	242-248
Number of pages	7
DOIs	https://doi.org/10.1109/IPC.2007.53
Publication status	Published - 2007
Externally published	Yes
Event	2007 International Conference on Intelligent Pervasive Computing, IPC 2007 - Jeju Island, Korea, Republic of Duration: 11 Oct 2007 → 13 Oct 2007

Publication series

Name	Proceedings The 2007 International Conference on Intelligent Pervasive Computing, IPC 2007

Conference

Conference	2007 International Conference on Intelligent Pervasive Computing, IPC 2007
Country/Territory	Korea, Republic of
City	Jeju Island
Period	11/10/07 → 13/10/07

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10.1109/IPC.2007.53

Cite this

Ha, Y., & Jeong, H. (2007). Photomask defect extraction by using difference between a reference image and a test image after illumination adjustment. In Proceedings The 2007 International Conference on Intelligent Pervasive Computing, IPC 2007 (pp. 242-248). Article 4438433 (Proceedings The 2007 International Conference on Intelligent Pervasive Computing, IPC 2007). https://doi.org/10.1109/IPC.2007.53

@inproceedings{3082ff7f51e04db2bd55c84cbc22de42,

title = "Photomask defect extraction by using difference between a reference image and a test image after illumination adjustment",

abstract = "A new method for extracting a photomask defect by using two optical photomask images, a reference image and a test image, is described in this paper. If the same scale, the same height-to-width ratio, zero parallel translation, and zero rotation between two images are assumed, then a large pixel value of the absolute difference image between the images would indicate the existence of a defect at the pixel. However, not only a true defect but a false defect also causes some large pixel values in the absolute difference image due to illumination difference between the reference image and the test image. To adjust the illumination of the reference image to that of the test image, a dynamic programming is used, and the defect in the test image is segmented.",

author = "Youngmin Ha and Hong Jeong",

year = "2007",

doi = "10.1109/IPC.2007.53",

language = "English",

isbn = "0769530060",

series = "Proceedings The 2007 International Conference on Intelligent Pervasive Computing, IPC 2007",

pages = "242--248",

booktitle = "Proceedings The 2007 International Conference on Intelligent Pervasive Computing, IPC 2007",

note = "2007 International Conference on Intelligent Pervasive Computing, IPC 2007 ; Conference date: 11-10-2007 Through 13-10-2007",

}

Ha, Y & Jeong, H 2007, Photomask defect extraction by using difference between a reference image and a test image after illumination adjustment. in Proceedings The 2007 International Conference on Intelligent Pervasive Computing, IPC 2007., 4438433, Proceedings The 2007 International Conference on Intelligent Pervasive Computing, IPC 2007, pp. 242-248, 2007 International Conference on Intelligent Pervasive Computing, IPC 2007, Jeju Island, Korea, Republic of, 11/10/07. https://doi.org/10.1109/IPC.2007.53

Photomask defect extraction by using difference between a reference image and a test image after illumination adjustment. / Ha, Youngmin; Jeong, Hong.
Proceedings The 2007 International Conference on Intelligent Pervasive Computing, IPC 2007. 2007. p. 242-248 4438433 (Proceedings The 2007 International Conference on Intelligent Pervasive Computing, IPC 2007).

Research output: Chapter in Book or Report/Conference proceeding › Conference Proceeding › peer-review

TY - GEN

T1 - Photomask defect extraction by using difference between a reference image and a test image after illumination adjustment

AU - Ha, Youngmin

AU - Jeong, Hong

PY - 2007

Y1 - 2007

N2 - A new method for extracting a photomask defect by using two optical photomask images, a reference image and a test image, is described in this paper. If the same scale, the same height-to-width ratio, zero parallel translation, and zero rotation between two images are assumed, then a large pixel value of the absolute difference image between the images would indicate the existence of a defect at the pixel. However, not only a true defect but a false defect also causes some large pixel values in the absolute difference image due to illumination difference between the reference image and the test image. To adjust the illumination of the reference image to that of the test image, a dynamic programming is used, and the defect in the test image is segmented.

AB - A new method for extracting a photomask defect by using two optical photomask images, a reference image and a test image, is described in this paper. If the same scale, the same height-to-width ratio, zero parallel translation, and zero rotation between two images are assumed, then a large pixel value of the absolute difference image between the images would indicate the existence of a defect at the pixel. However, not only a true defect but a false defect also causes some large pixel values in the absolute difference image due to illumination difference between the reference image and the test image. To adjust the illumination of the reference image to that of the test image, a dynamic programming is used, and the defect in the test image is segmented.

UR - http://www.scopus.com/inward/record.url?scp=50249099225&partnerID=8YFLogxK

U2 - 10.1109/IPC.2007.53

DO - 10.1109/IPC.2007.53

M3 - Conference Proceeding

AN - SCOPUS:50249099225

SN - 0769530060

SN - 9780769530062

T3 - Proceedings The 2007 International Conference on Intelligent Pervasive Computing, IPC 2007

SP - 242

EP - 248

BT - Proceedings The 2007 International Conference on Intelligent Pervasive Computing, IPC 2007

T2 - 2007 International Conference on Intelligent Pervasive Computing, IPC 2007

Y2 - 11 October 2007 through 13 October 2007

ER -

Ha Y, Jeong H. Photomask defect extraction by using difference between a reference image and a test image after illumination adjustment. In Proceedings The 2007 International Conference on Intelligent Pervasive Computing, IPC 2007. 2007. p. 242-248. 4438433. (Proceedings The 2007 International Conference on Intelligent Pervasive Computing, IPC 2007). doi: 10.1109/IPC.2007.53

Photomask defect extraction by using difference between a reference image and a test image after illumination adjustment

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