TY - GEN
T1 - Oblique fringe measurement by pattern correlation
AU - Liu, Lanjiao
AU - Pan, Haiyan
AU - Xu, Jia
AU - Xu, Hongmei
AU - Song, Zhengxun
AU - Weng, Zhankun
AU - Hu, Zhen
AU - Zhang, Jin
AU - Yue, Yong
AU - Li, Dayou
AU - Wang, Zuobin
PY - 2010
Y1 - 2010
N2 - This paper introduces a method for the determination of the slope and period of oblique and equi-spaced fringes by pattern correlation. In the method, two pairs of image patches in two different regions of a fringe pattern are selected for pattern correlation calculations, and the phase shift between the two selected regions of the fringe pattern is obtained from the phase curves computed with the correlation function. The computer simulation and experiment have shown that this method is useful in interferometry and laser interference lithography for determining the slope and period of the oblique and equi-spaced fringe patterns with the advantage of high resistance to noise. It has potential applications for the measurement of the fringe pattern period, fringe angle, phase difference, displacement, and other relevant physical quantities. In practice, it can also be used for the orientation of interference patterns and alignment of laser interference lithography systems.
AB - This paper introduces a method for the determination of the slope and period of oblique and equi-spaced fringes by pattern correlation. In the method, two pairs of image patches in two different regions of a fringe pattern are selected for pattern correlation calculations, and the phase shift between the two selected regions of the fringe pattern is obtained from the phase curves computed with the correlation function. The computer simulation and experiment have shown that this method is useful in interferometry and laser interference lithography for determining the slope and period of the oblique and equi-spaced fringe patterns with the advantage of high resistance to noise. It has potential applications for the measurement of the fringe pattern period, fringe angle, phase difference, displacement, and other relevant physical quantities. In practice, it can also be used for the orientation of interference patterns and alignment of laser interference lithography systems.
KW - Fringe measurement
KW - Interferometry
KW - Laser interference lithography
KW - Oblique fringe
KW - Pattern correlation
UR - http://www.scopus.com/inward/record.url?scp=77955750255&partnerID=8YFLogxK
U2 - 10.1109/ICINFA.2010.5512137
DO - 10.1109/ICINFA.2010.5512137
M3 - Conference Proceeding
AN - SCOPUS:77955750255
SN - 9781424457021
T3 - 2010 IEEE International Conference on Information and Automation, ICIA 2010
SP - 940
EP - 945
BT - 2010 IEEE International Conference on Information and Automation, ICIA 2010
T2 - 2010 IEEE International Conference on Information and Automation, ICIA 2010
Y2 - 20 June 2010 through 23 June 2010
ER -