Microstructural and surface properties of cobalt containing amorphous carbon thin film deposited by a filtered cathodic vacuum arc

Daniel H.C. Chua*, W. I. Milne, B. K. Tay, P. Zhang, X. Z. Ding

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)


Surface properties of ta-C:Co films deposited under different conditions were investigated with x-ray photoelectron spectroscopy (XPS) and contact angle measurements. Two different sets of films, one produced by varying Co-content and the other produced by varying the applied bias, were deposited and tested. XPS and Raman measurements showed that the carbon sp3 content was maximum at low Co content under approximately -80 V bias. An increase in bias from -120 V to -500 V caused a huge increase in sp2 content over the entire film.

Original languageEnglish
Pages (from-to)353-358
Number of pages6
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Issue number2
Publication statusPublished - Mar 2003
Externally publishedYes

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