Measurement of nanoscale surface patterns produced by two-beam laser interference lithography

Haiyan Pan; Lanjiao Liu; Jia Xu; Hongmei Xu; Zhengxun Song; Zhankun Weng; Zhen Hu; Jin Zhang; Yong Yue; Dayou Li; Zuobin Wang

doi:10.1109/ICMA.2010.5588724

Measurement of nanoscale surface patterns produced by two-beam laser interference lithography

Haiyan Pan^*, Lanjiao Liu, Jia Xu, Hongmei Xu, Zhengxun Song, Zhankun Weng, Zhen Hu, Jin Zhang, Yong Yue, Dayou Li, Zuobin Wang

^*Corresponding author for this work

Research output: Chapter in Book or Report/Conference proceeding › Conference Proceeding › peer-review

1 Citation (Scopus)

Abstract

This paper presents a method for the measurement of nanoscale surface patterns produced by two-beam laser interference lithography (LIL). In the work, the combination of the Hough fitting and the least-squares fitting was first used to fit the edges of the fringe patterns and measure the slopes and periods of them in computer simulation, and then it was also used to inspect the nanoscale surface patterns from a two-beam LIL process. The computer simulation and experimentation results have shown that the method has the advantages of both high resistance to noise and high accuracy of measurement.

Original language	English
Title of host publication	2010 IEEE International Conference on Mechatronics and Automation, ICMA 2010
Pages	1754-1759
Number of pages	6
DOIs	https://doi.org/10.1109/ICMA.2010.5588724
Publication status	Published - 2010
Externally published	Yes
Event	2010 IEEE International Conference on Mechatronics and Automation, ICMA 2010 - Xi'an, China Duration: 4 Aug 2010 → 7 Aug 2010

Publication series

Name	2010 IEEE International Conference on Mechatronics and Automation, ICMA 2010

Conference

Conference	2010 IEEE International Conference on Mechatronics and Automation, ICMA 2010
Country/Territory	China
City	Xi'an
Period	4/08/10 → 7/08/10

Access to Document

10.1109/ICMA.2010.5588724

Cite this

Pan, H., Liu, L., Xu, J., Xu, H., Song, Z., Weng, Z., Hu, Z., Zhang, J., Yue, Y., Li, D., & Wang, Z. (2010). Measurement of nanoscale surface patterns produced by two-beam laser interference lithography. In 2010 IEEE International Conference on Mechatronics and Automation, ICMA 2010 (pp. 1754-1759). Article 5588724 (2010 IEEE International Conference on Mechatronics and Automation, ICMA 2010). https://doi.org/10.1109/ICMA.2010.5588724

@inproceedings{d81d5188971d4342b0f13dd4855a5961,

title = "Measurement of nanoscale surface patterns produced by two-beam laser interference lithography",

abstract = "This paper presents a method for the measurement of nanoscale surface patterns produced by two-beam laser interference lithography (LIL). In the work, the combination of the Hough fitting and the least-squares fitting was first used to fit the edges of the fringe patterns and measure the slopes and periods of them in computer simulation, and then it was also used to inspect the nanoscale surface patterns from a two-beam LIL process. The computer simulation and experimentation results have shown that the method has the advantages of both high resistance to noise and high accuracy of measurement.",

author = "Haiyan Pan and Lanjiao Liu and Jia Xu and Hongmei Xu and Zhengxun Song and Zhankun Weng and Zhen Hu and Jin Zhang and Yong Yue and Dayou Li and Zuobin Wang",

year = "2010",

doi = "10.1109/ICMA.2010.5588724",

language = "English",

isbn = "9781424451418",

series = "2010 IEEE International Conference on Mechatronics and Automation, ICMA 2010",

pages = "1754--1759",

booktitle = "2010 IEEE International Conference on Mechatronics and Automation, ICMA 2010",

note = "2010 IEEE International Conference on Mechatronics and Automation, ICMA 2010 ; Conference date: 04-08-2010 Through 07-08-2010",

}

Pan, H, Liu, L, Xu, J, Xu, H, Song, Z, Weng, Z, Hu, Z, Zhang, J, Yue, Y, Li, D & Wang, Z 2010, Measurement of nanoscale surface patterns produced by two-beam laser interference lithography. in 2010 IEEE International Conference on Mechatronics and Automation, ICMA 2010., 5588724, 2010 IEEE International Conference on Mechatronics and Automation, ICMA 2010, pp. 1754-1759, 2010 IEEE International Conference on Mechatronics and Automation, ICMA 2010, Xi'an, China, 4/08/10. https://doi.org/10.1109/ICMA.2010.5588724

Measurement of nanoscale surface patterns produced by two-beam laser interference lithography. / Pan, Haiyan; Liu, Lanjiao; Xu, Jia et al.
2010 IEEE International Conference on Mechatronics and Automation, ICMA 2010. 2010. p. 1754-1759 5588724 (2010 IEEE International Conference on Mechatronics and Automation, ICMA 2010).

Research output: Chapter in Book or Report/Conference proceeding › Conference Proceeding › peer-review

TY - GEN

T1 - Measurement of nanoscale surface patterns produced by two-beam laser interference lithography

AU - Pan, Haiyan

AU - Liu, Lanjiao

AU - Xu, Jia

AU - Xu, Hongmei

AU - Song, Zhengxun

AU - Weng, Zhankun

AU - Hu, Zhen

AU - Zhang, Jin

AU - Yue, Yong

AU - Li, Dayou

AU - Wang, Zuobin

PY - 2010

Y1 - 2010

N2 - This paper presents a method for the measurement of nanoscale surface patterns produced by two-beam laser interference lithography (LIL). In the work, the combination of the Hough fitting and the least-squares fitting was first used to fit the edges of the fringe patterns and measure the slopes and periods of them in computer simulation, and then it was also used to inspect the nanoscale surface patterns from a two-beam LIL process. The computer simulation and experimentation results have shown that the method has the advantages of both high resistance to noise and high accuracy of measurement.

AB - This paper presents a method for the measurement of nanoscale surface patterns produced by two-beam laser interference lithography (LIL). In the work, the combination of the Hough fitting and the least-squares fitting was first used to fit the edges of the fringe patterns and measure the slopes and periods of them in computer simulation, and then it was also used to inspect the nanoscale surface patterns from a two-beam LIL process. The computer simulation and experimentation results have shown that the method has the advantages of both high resistance to noise and high accuracy of measurement.

UR - http://www.scopus.com/inward/record.url?scp=78649239126&partnerID=8YFLogxK

U2 - 10.1109/ICMA.2010.5588724

DO - 10.1109/ICMA.2010.5588724

M3 - Conference Proceeding

AN - SCOPUS:78649239126

SN - 9781424451418

T3 - 2010 IEEE International Conference on Mechatronics and Automation, ICMA 2010

SP - 1754

EP - 1759

BT - 2010 IEEE International Conference on Mechatronics and Automation, ICMA 2010

T2 - 2010 IEEE International Conference on Mechatronics and Automation, ICMA 2010

Y2 - 4 August 2010 through 7 August 2010

ER -

Measurement of nanoscale surface patterns produced by two-beam laser interference lithography

Abstract

Publication series

Conference

Access to Document

Other files and links

Cite this