Effects of atomic hydrogen on the selective area growth of Si and Si 1-xGe x thin films on Si and SiO 2 surfaces: Inhibition, nucleation, and growth

T. W. Schroeder, A. M. Lam, P. F. Ma, J. R. Engstrom*

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

11 Citations (Scopus)

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