TY - GEN
T1 - Direct laser interference technology and potential applications
AU - Yue, Yong
AU - Wang, Dapeng
AU - Zhang, Ziang
AU - Maple, Carsten
AU - Wang, Zuobin
AU - Li, Dayou
AU - Qiu, Renxi
N1 - Publisher Copyright:
© 2014 IEEE.
PY - 2014/3/9
Y1 - 2014/3/9
N2 - Development of direct laser interference technology (DLIT) is reviewed in this paper. With the merits of being independent on the pretreatment, mask and pattern transfer processes, DLIT is demonstrated a facile and efficient method of producing sub-micro structures on various material surfaces. From a representative perspective, a number of past achievements, containing theoretical and practice aspects, attained by the nanosecond, picosecond, and femtosecond laser interference techniques are introduced. Advantages and limitations in comparison to one another are also addressed. With the progress of the emerging subwavelength structures (e.g. metasurfaces, plasmonic structures) offering the fascinating possibility of controlling the behaviour of light in an unprecedented way, the perspectives of potential applications benefited from DLIT are finally given.
AB - Development of direct laser interference technology (DLIT) is reviewed in this paper. With the merits of being independent on the pretreatment, mask and pattern transfer processes, DLIT is demonstrated a facile and efficient method of producing sub-micro structures on various material surfaces. From a representative perspective, a number of past achievements, containing theoretical and practice aspects, attained by the nanosecond, picosecond, and femtosecond laser interference techniques are introduced. Advantages and limitations in comparison to one another are also addressed. With the progress of the emerging subwavelength structures (e.g. metasurfaces, plasmonic structures) offering the fascinating possibility of controlling the behaviour of light in an unprecedented way, the perspectives of potential applications benefited from DLIT are finally given.
KW - Direct laser interference technology
KW - Nanosecond
KW - picosecond and femtosecond interference
UR - http://www.scopus.com/inward/record.url?scp=84946690850&partnerID=8YFLogxK
U2 - 10.1109/3M-NANO.2014.7057359
DO - 10.1109/3M-NANO.2014.7057359
M3 - Conference Proceeding
AN - SCOPUS:84946690850
T3 - 2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2014 - Conference Proceedings
SP - 351
EP - 354
BT - 2014 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2014 - Conference Proceedings
A2 - Kallio, Pasi
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 4th International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2014
Y2 - 27 October 2014 through 31 October 2014
ER -