Abstract
The thin films of Co-doped and Co3O4-doped dielectric LaAlO3 (LAO) by co-ablation of magnetic metal Co and dielectric LAO on Pt - Ti - SiO2 - Si substrates have been prepared by pulsed laser deposition. A significant enhancement of dielectric constant of LAO upon doping of Co and cobalt oxide clusters is observed. Furthermore, modulation of the dielectric constant of the thin films by applying a magnetic field is verified, obviously due to the ferromagnetism of Co metal and Co oxide clusters embedded in the LAO thin films. A series of microstructural and dielectric characterizations on the as-prepared thin films have been performed and the mechanism underlying the dielectric enhancement upon the doping of Co and Co3O4 clusters is discussed.
Original language | English |
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Pages (from-to) | 2676-2681 |
Number of pages | 6 |
Journal | International Journal of Modern Physics B |
Volume | 19 |
Issue number | 15-17 |
DOIs | |
Publication status | Published - 10 Jul 2005 |
Externally published | Yes |
Keywords
- Dielectric capacitance
- Magnetism
- Nanoparticle