Compact transmission line design in a multi-metallization nano-CMOS process for millimeter-wave integrated circuits

Sang Lam, Mansun Chan

Research output: Chapter in Book or Report/Conference proceedingConference Proceedingpeer-review

4 Citations (Scopus)

Abstract

A compact transmission line design based on the conventional microwave stripline is presented for implementation of millimeter-wave CMOS integrated circuits. In a 65-nm process, the design gives a low insertion loss of 2.2 dB/mm at 60 GHz as determined by 3D electromagnetic (EM) simulations. A 50-Ω characteristic impedance is achieved resulting in a reflection coefficient of about -27 dB up to 80 GHz. The transmission line structure occupies minimal space of less than 17 μm in width and it accommodates active devices beneath it unaffected by any possible EM interference.

Original languageEnglish
Title of host publicationIRMMW-THz 2015 - 40th International Conference on Infrared, Millimeter, and Terahertz Waves
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781479982721
DOIs
Publication statusPublished - 11 Nov 2015
Event40th International Conference on Infrared, Millimeter, and Terahertz Waves, IRMMW-THz 2015 - Hong Kong, China
Duration: 23 Aug 201528 Aug 2015

Publication series

NameIRMMW-THz 2015 - 40th International Conference on Infrared, Millimeter, and Terahertz Waves

Conference

Conference40th International Conference on Infrared, Millimeter, and Terahertz Waves, IRMMW-THz 2015
Country/TerritoryChina
CityHong Kong
Period23/08/1528/08/15

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