TY - GEN
T1 - An automatic method for extracting and classifying defect in optical photomask images
AU - Ha, Youngmin
AU - Jeong, Hong
PY - 2007
Y1 - 2007
N2 - This paper describes the process of extracting and classifying defect in optical photomask images. It describes photomask defect extraction which is the preprocessing of classification. In addition, it describes not only how to classify defect into false, particle on glass, and pattern defect but also how to classify pattern defect into spot, Cr extension, bridge, MoSiN bridge, pinhole, clear extension, break, and stitching. Also, how to classify a particle according to its size is presented.
AB - This paper describes the process of extracting and classifying defect in optical photomask images. It describes photomask defect extraction which is the preprocessing of classification. In addition, it describes not only how to classify defect into false, particle on glass, and pattern defect but also how to classify pattern defect into spot, Cr extension, bridge, MoSiN bridge, pinhole, clear extension, break, and stitching. Also, how to classify a particle according to its size is presented.
UR - http://www.scopus.com/inward/record.url?scp=37349055010&partnerID=8YFLogxK
U2 - 10.1109/MUE.2007.66
DO - 10.1109/MUE.2007.66
M3 - Conference Proceeding
AN - SCOPUS:37349055010
SN - 0769527779
SN - 9780769527772
T3 - Proceedings - 2007 International Conference on Multimedia and Ubiquitous Engineering, MUE 2007
SP - 710
EP - 716
BT - Proceedings - 2007 International Conference on Multimedia and Ubiquitous Engineering, MUE 2007
T2 - 2007 International Conference on Multimedia and Ubiquitous Engineering, MUE 2007
Y2 - 26 April 2007 through 28 April 2007
ER -