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Total dose effects and bias instabilities of (NH4)2S passivated Ge MOS capacitors with HfxZr1-xOy thin films
Yifei Mu, Yuxiao Fang, Ce Zhou Zhao*, Chun Zhao, Qifeng Lu, Yanfei Qi, Ruowei Yi, Li Yang, Ivona Z. Mitrovic, Stephen Taylor, Paul R. Chalker
*Corresponding author for this work
Research output: Contribution to journal › Article › peer-review
4
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(Scopus)