@inproceedings{4e56d36cdbf34349a3adf6a4d222c6f8,
title = "Split-Path Bootstrap GaN MIS-HEMT Gate Driver for Fast Switching of Power Devices",
abstract = "Gallium Nitride (GaN) devices offer excellent switching performance and high efficiency, making them ideal for next-generation power converters. At high operating frequencies and power densities, fast gate control is essential to reduce switching losses and thereby alleviate thermal stress. This paper introduces a novel split-path bootstrap gate driver topology designed to achieve ultra-fast switching transitions with low propagation delay. Utilizing a shared bootstrap capacitor for both the high-side pre-driver and an optional pull-up transistor, the proposed circuit improves area efficiency and supports higher power density. Circuit simulations using the GaN MIS-HEMT ASM model demonstrate short rise/fall times of 9 ns/6 ns, propagation delays of 16 ns/11 ns, and a maximum operating frequency of 8 MHz under a 2 nF capacitive load. These characteristics make the proposed driver well-suited for efficient operation in MHz-range power converters, with great potential for monolithic GaN integration.",
keywords = "circuit simulation, fast switching, GaN, gate driver, shared bootstrap capacitor, split-path",
author = "Haoyu Wang and Yunsong Xu and Shenlei Ding and Jiangmin Gu and Low, \{Kain Lu\} and Ang Li and Wen Liu",
note = "Publisher Copyright: {\textcopyright} 2025 IEEE.; 22th China International Forum on Solid State Lighting and 11th International Forum on Wide Bandgap Semiconductors, SSLCHINA:IFWS 2025 ; Conference date: 11-11-2025 Through 14-11-2025",
year = "2025",
doi = "10.1109/SSLCHINAIFWS69008.2025.11314974",
language = "English",
series = "2025 22th China International Forum on Solid State Lighting and 2025 11th International Forum on Wide Bandgap Semiconductors, SSLCHINA: IFWS 2025",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "315--317",
booktitle = "2025 22th China International Forum on Solid State Lighting and 2025 11th International Forum on Wide Bandgap Semiconductors, SSLCHINA",
}