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Monolithically Integrated Logic Circuits based on p-NiO gated E-mode GaN HEMTs

  • Chuanqi Pan
  • , Xinxin Yu
  • , Fan Li
  • , Hehe Gong
  • , Denggui Wang
  • , Jianjun Zhou
  • , Zhonghui Li
  • , Wen Liu
  • , Dunjun Chen
  • , Shulin Gu
  • , Youdou Zheng
  • , Rong Zhang
  • , Jiandong Ye
  • Nanjing Electronic Devices Institute
  • University of Liverpool
  • Nanjing University

Research output: Contribution to journalArticlepeer-review

16 Citations (Scopus)

Abstract

High-performance GaN based one-chip direct coupled field-effect-transistor logic (DCFL) circuits were demonstrated, in which enhancement-mode (E-mode) GaN high electron mobility transistors (HEMTs) were formed simultaneously with depletion-mode (D-mode) components through the selective-area growth of p-NiO gates at room temperature by sputtering. The process boasts advantages such as a low thermal budget cost, eliminating the need for high-temperature regrowth of p-GaN, and preventing dry-etch damage. The E-mode HEMT showcases a high current density of 1.3 A/mm, a positive threshold voltage of 0.83 V, and an ON-OFF current ratio of 7.24×108, which enable input/output logic level matching with a low drive/load ratio of 1.0. The E/D-mode inverter exhibits substantial logic-low and logic-high noise margins of 2.09 V and 2.45 V, respectively, a logic voltage swing of 4.78 V, a switching threshold of 2.45 V and a voltage gain of 42 at a supply voltage of 5.0 V. With the demonstrated capability to drive power switches, this architecture provides an elegant solution for high-frequency power switching applications.

Original languageEnglish
Pages (from-to)1
Number of pages1
JournalIEEE Electron Device Letters
Volume45
Issue number2
DOIs
Publication statusAccepted/In press - 2023

Keywords

  • Aluminum gallium nitride
  • E-mode
  • E/D integrated circuits
  • GaN HEMT
  • HEMTs
  • Inverters
  • Logic gates
  • MODFETs
  • p-NiO
  • Power ICs
  • Threshold voltage
  • Wide band gap semiconductors

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