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Low temperature solution-processed IGZO thin-film transistors

  • Wangying Xu
  • , Luyao Hu
  • , Chun Zhao
  • , Lingjiao Zhang
  • , Deliang Zhu*
  • , Peijiang Cao
  • , Wenjun Liu
  • , Shun Han
  • , Xinke Liu
  • , Fang Jia
  • , Yuxiang Zeng
  • , Youming Lu
  • *Corresponding author for this work
  • Shenzhen University

Research output: Contribution to journalArticlepeer-review

77 Citations (Scopus)

Abstract

We reported the low-temperature high performance IGZO TFTs by solution processing. The influence of IGZO composition over broad range on thin films and devices properties were investigated by a wide range of characterization techniques. The schematic of TFT solution-processed IGZO TFTs mobility with different compositions has been obtained. In order to achieve decent TFT performance, the In content should be much high for solution-processed IGZO TFTs. The optimal solution-processed IGZO TFTs with In:Ga:Zn = 5:1:1 composition exhibited a large mobility of 9.1 cm 2 V −1 s −1 , low subthreshold swing of 0.22 V/decade, and high on/off ratio of 10 6 at 300 °C processing temperature.

Original languageEnglish
Pages (from-to)554-560
Number of pages7
JournalApplied Surface Science
Volume455
DOIs
Publication statusPublished - 15 Oct 2018

Keywords

  • IGZO
  • Low-temperature
  • Solution-processed
  • Thin-film transistors

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