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Low ON-State Resistance Normally-OFF AlGaN/GaN MIS-HEMTs with Partially Recessed Gate and ZrO Charge Trapping Layer

    • Xi'an Jiaotong-Liverpool University
    • University of Liverpool

    Research output: Contribution to journalArticlepeer-review

    41 Citations (Scopus)

    Abstract

    Novel normally-OFF AlGaN/GaN MIS-high electron mobility transistors (HEMTs) with a ZrOx charge trapping layer are proposed. The deposition of the ZrOx charge trapping layer on the partially recessed AlGaN in conjunction with the Al2O3 gate dielectric has been accomplished. The developed MIS-HEMTs exhibit a threshold voltage of 1.55 ± 0.4 V and a maximum drain current of 730 ± 6 mA/mm, while associated low ON-resistance of 7.1 ± 0.2 Ω mm, for a gate to drain separation of 3 μm. The TCAD simulation results are presented to explore the charge trapping and de-trapping behaviors. Moreover, the devices exhibit a high breakdown voltage. The results indicate the merits of employing ZrOx charge trapping layer to realize the normally-OFF GaN devices with low ON-state resistance.

    Original languageEnglish
    Article number9511633
    Pages (from-to)4310-4316
    Number of pages7
    JournalIEEE Transactions on Electron Devices
    Volume68
    Issue number9
    DOIs
    Publication statusPublished - 1 Sept 2021

    Keywords

    • AlGaN/GaN
    • MIS-high electron mobility transistors (HEMTs)
    • ON-resistance
    • ZrO
    • breakdown voltage
    • normally-OFF

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