Skip to main navigation Skip to search Skip to main content

Fully Solution-Processed Sodium Doped ZnO Thin-Film Transistors via a Low-Temperature Aqueous Route

  • Q. H. Liu
  • , Y. L. Wei
  • , Y. X. Cao
  • , C. Zhao
  • , C. Z. Zhao*
  • , I. Z. Mitrovic
  • , S. Hall
  • , W. Y. Xu
  • , L. Yang
  • , E. G. Lim
  • , Q. N. Wang
  • *Corresponding author for this work
  • Xi'an Jiaotong-Liverpool University
  • University of Liverpool
  • Shenzhen University

Research output: Chapter in Book or Report/Conference proceedingConference Proceedingpeer-review

1 Citation (Scopus)

Abstract

In this study, we develop a simple and eco-friendly aqueous route for the fabrication of sodium (Na) doped ZnO/AlOxthin-film transistors (TFTs). To prepare Na doped ZnO and AlOxthin films, ammonia water and deionized water were used as the precursor solvents. The A1Oxthin film annealed at 300°C showed an areal-capacitance of 129 nf/cm2 at 1 kHz. On the basis of its implementation as the gate oxide, fully solution-processed Na doped ZnO TFTs were fabricated and the electrical characteristics were systematically studied. The fully solution processed Na doped ZnO/A1OxTFTs exhibited a high field effect mobility of 21 cm2 V-1 s-1, a subthreshold swing of 0.58 V/decade, a threshold voltage of 0.8 V, and an on/off current ratio of 2×104.

Original languageEnglish
Title of host publication2019 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2019
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781728116587
DOIs
Publication statusPublished - Apr 2019
Event2019 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2019 - Grenoble, France
Duration: 1 Apr 20193 Apr 2019

Publication series

Name2019 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2019

Conference

Conference2019 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2019
Country/TerritoryFrance
CityGrenoble
Period1/04/193/04/19

Keywords

  • aqueous route
  • low-temperature
  • metal oxide thin-film transistors
  • solution-processed

Cite this