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Determination of two-dimensional phase shifts in three-beam laser interference patterns

  • Yinbao Lei*
  • , Zuobin Wang
  • , Jia Xu
  • , Jinjin Zhang
  • , Dapeng Wang
  • , Yu Hou
  • , Yong Yue
  • , Dayou Li
  • *Corresponding author for this work
  • Changchun University of Science and Technology
  • University of Bedfordshire

Research output: Chapter in Book or Report/Conference proceeding › Conference Proceeding › peer-review

2 Citations (Scopus)

Abstract

This paper describes a method of determining two-dimensional phase shifts. In this method, the two-dimensional phase shift is divided into horizontal and vertical components, and each component of the phase shift is determined by pattern correlation, Pythagorean theorem and linear interpolation with subpixel accuracy. The computer simulation and experiment have shown that the method is useful for the determination of phase difference between two three-beam interference patterns. The method can also be used to determine the phase shift in other multi-beam interference patterns.

Original languageEnglish
Title of host publication2012 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2012 - Conference Proceedings
Pages9-13
Number of pages5
DOIs
Publication statusPublished - 2012
Externally publishedYes
Event2012 2nd International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2012 - Xi'an, China
Duration: 29 Aug 2012 → 1 Sept 2012

Publication series

Name2012 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2012 - Conference Proceedings

Conference

Conference2012 2nd International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2012
Country/TerritoryChina
CityXi'an
Period29/08/12 → 1/09/12

Keywords

  • Laser interference lithography
  • correlation coefficient
  • two-dimensional phase shift

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