Characteristics of Ni/AlO Pt RRAM devices with various dielectric fabrication temperatures

Z. J. Shen, C. Zhao, C. Z. Zhao, I. Z. Mitrovic, L. Yang, W. Y. Xu, E. G. Lim, T. Luo, Y. B. Huang

Research output: Chapter in Book or Report/Conference proceedingConference Proceedingpeer-review

2 Citations (Scopus)

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