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Application of selective SiGe epitaxy for recessed source/drain of PMOS transistor
Yihwan Kim*, Arkadii Samoilov, Lori Washington, Victor Moroz, Andrew Lam, Nicholas Dalida, Mark Kawaguchi, Meihua Shen
*Corresponding author for this work
Research output: Contribution to conference › Paper › peer-review
4
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(Scopus)