Application of selective Si:C epitaxy for recessed source/drain Technology

Yihwan Kim*, Zhiyuan Ye, Ali Zojaji, Andrew Lam, Errol Sanchez, Satheesh Kuppurao

*Corresponding author for this work

Research output: Chapter in Book or Report/Conference proceedingConference Proceedingpeer-review

4 Citations (Scopus)

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