Al/GO/Si/Al RRAM with Solution-processed GO dielectric at Low Fabrication Temperature

Z. J. Shen, C. Zhao*, C. Z. Zhao, I. Z. Mitrovic, L. Yang, W. Y. Xu, E. G. Lim, T. Luo, Y. B. Huang

*Corresponding author for this work

Research output: Chapter in Book or Report/Conference proceedingConference Proceedingpeer-review

1 Citation (Scopus)

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