A promising method to improve the bias-stress and biased-radiation-stress stabilities of solution-processed AlOx thin films

Yuxiao Fang, Wangying Xu, Tianshi Zhao, Ivona Z. Mitrovic, Li Yang, Chun Zhao*, Cezhou Zhao

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

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