Radiation hardness of lanthanide doped HfO2 and ultrathin HfO2 gate dielectrics

  • Zhao, Cezhou (PI)
  • Yang, Yishang (Team member)
  • Tao, Jing (Team member)
  • Chalke, Paul (Team member)
  • Taylor, Stephen (Team member)

Project: Governmental Research Project

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Chemistry

Material Science