Description
The Frontier Symposium on Semiconductor Manufacturing Simulation Technologies was successfully held, bringing together experts from academia and industry to discuss plasma etching, GAA device processes, and AI-driven atomistic simulations. The program featured keynote talks on plasma diagnostics, fast simulation methods, AI-enhanced semiconductor technologies, and advanced etching for GAA devices, complemented by a process line tour and an open discussion session. The event fostered valuable knowledge exchange and collaboration, highlighting the growing role of simulation in accelerating semiconductor manufacturing innovation.| Period | 20 May 2025 |
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| Held at | Institute of Microelectronics, Chinese Academy of Sciences |
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Projects
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Advancing GaN CMOS Technology: Optimizing Device Performance and Design Efficiency through AI-Integrated TCAD Modeling
Project: Internal Research Project