The Frontier Symposium on Semiconductor Manufacturing Simulation Technologies was successfully held, bringing together experts from academia and industry to discuss plasma etching, GAA device processes, and AI-driven atomistic simulations. The program featured keynote talks on plasma diagnostics, fast simulation methods, AI-enhanced semiconductor technologies, and advanced etching for GAA devices, complemented by a process line tour and an open discussion session. The event fostered valuable knowledge exchange and collaboration, highlighting the growing role of simulation in accelerating semiconductor manufacturing innovation.
Period
20 May 2025
Held at
Institute of Microelectronics, Chinese Academy of Sciences